JPH0535225B2 - - Google Patents

Info

Publication number
JPH0535225B2
JPH0535225B2 JP60121726A JP12172685A JPH0535225B2 JP H0535225 B2 JPH0535225 B2 JP H0535225B2 JP 60121726 A JP60121726 A JP 60121726A JP 12172685 A JP12172685 A JP 12172685A JP H0535225 B2 JPH0535225 B2 JP H0535225B2
Authority
JP
Japan
Prior art keywords
gas
flow rate
flow path
raw material
carrier gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60121726A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61279678A (ja
Inventor
Sukeyuki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON TYLAN KK
Original Assignee
NIPPON TYLAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON TYLAN KK filed Critical NIPPON TYLAN KK
Priority to JP60121726A priority Critical patent/JPS61279678A/ja
Publication of JPS61279678A publication Critical patent/JPS61279678A/ja
Publication of JPH0535225B2 publication Critical patent/JPH0535225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Chemical Vapour Deposition (AREA)
JP60121726A 1985-06-05 1985-06-05 流量制御装置 Granted JPS61279678A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60121726A JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60121726A JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Publications (2)

Publication Number Publication Date
JPS61279678A JPS61279678A (ja) 1986-12-10
JPH0535225B2 true JPH0535225B2 (en]) 1993-05-26

Family

ID=14818356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60121726A Granted JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Country Status (1)

Country Link
JP (1) JPS61279678A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024182315A1 (en) * 2023-03-02 2024-09-06 Lam Research Corporation Flow-over-vapor precursor delivery

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5281364B2 (ja) * 2008-10-31 2013-09-04 株式会社堀場製作所 材料ガス濃度制御システム
JP5145193B2 (ja) * 2008-10-31 2013-02-13 株式会社堀場製作所 材料ガス濃度制御システム
KR101578220B1 (ko) * 2008-10-31 2015-12-16 가부시키가이샤 호리바 세이샤쿠쇼 재료가스 농도 제어 시스템
JP5281363B2 (ja) * 2008-10-31 2013-09-04 株式会社堀場製作所 材料ガス濃度制御システム
WO2010106410A1 (en) * 2009-03-16 2010-09-23 Applied Materials, Inc. Evaporator, coating installation, and method for use thereof
JP5690498B2 (ja) * 2009-03-27 2015-03-25 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
JP5895712B2 (ja) * 2012-05-31 2016-03-30 東京エレクトロン株式会社 原料ガス供給装置、成膜装置、原料ガスの供給方法及び記憶媒体
US9243325B2 (en) * 2012-07-18 2016-01-26 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
JP6026875B2 (ja) * 2012-12-03 2016-11-16 日本エア・リキード株式会社 固体材料の気化量モニタリングシステムおよびモニタリング方法
JP2016040402A (ja) * 2014-08-12 2016-03-24 東京エレクトロン株式会社 原料ガス供給装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024182315A1 (en) * 2023-03-02 2024-09-06 Lam Research Corporation Flow-over-vapor precursor delivery

Also Published As

Publication number Publication date
JPS61279678A (ja) 1986-12-10

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